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Simultaneous Requirements: Defines in The Following Way

Simultaneous requirements apply when: 1) Two or more geometric tolerances reference common datum features in the same order of precedence and boundary conditions, creating a single pattern requirement. 2) Position and profile tolerances located by basic dimensions or relative to common datums specified as RMB are considered a single pattern by default. 3) When common datums are specified as MMB, it is optional whether multiple patterns are treated as a single or separate patterns, unless notation indicates separate requirements.

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Nishant Patil
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844 views7 pages

Simultaneous Requirements: Defines in The Following Way

Simultaneous requirements apply when: 1) Two or more geometric tolerances reference common datum features in the same order of precedence and boundary conditions, creating a single pattern requirement. 2) Position and profile tolerances located by basic dimensions or relative to common datums specified as RMB are considered a single pattern by default. 3) When common datums are specified as MMB, it is optional whether multiple patterns are treated as a single or separate patterns, unless notation indicates separate requirements.

Uploaded by

Nishant Patil
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
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  • Simultaneous Requirements: Explains the definition and application of simultaneous requirements according to the Y14.5-2009 standard.
  • ISO 5458-1999: Geometrical Tolerancing: Presents rules for geometrical tolerancing as defined by the ISO 5458-1999 standard, focusing on positional tolerances.
  • Simultaneous Requirement: MMB: Discusses the concept of simultaneous requirements with multiple patterns of features in MMB contexts.

SIMULTANEOUS

REQUIREMENTS

Y14.5-2009 defines Simultaneous Requirements in the following way:

 A simultaneous requirement is where two or more geometric tolerances apply as a single pattern or part
requirement.

 A simultaneous requirement applies to position and profile tolerances that are located by basic dimensions,
related to common datum features referenced in the same order of precedence at the same boundary
conditions.

 In a simultaneous requirement there is no translation or rotation between the datum reference frames of
the included geometric tolerances, thus creating a single pattern.

 Simultaneous Requirements apply by default in the Y14.5-2009 standard.


ISO 5458- 1999 : Geometrical Tolerancing- Positional Tol

If two or more groups of features are shown on the same axis, they shall be considered to be a single
pattern when
— they are not related to a datum;
— they are related to the same datum or datum system (datums in the same order of precedence or
under the same material conditions);
unless otherwise stated
Tolerances considered for SIM

Tolerance Type Applicability of Simultaneous Requirement


Position Applicable
Profile Applicable
Runout Not defined
Orientation Not defined
Size Not applicable
Form Not applicable
Simultaneous Requirements Applied to Position Tolerance

SIM: RMB

Where multiple patterns of features of size are located relative to common datum features not subject to
size tolerances, or to common datum features of size specified on an RMB basis, they are considered to
be a single pattern.
Simultaneous Requirement: MMB

Where any of the common datums in multiple patterns of features of size is specified on an MMB basis,
there is an option whether the patterns are to be considered as a single pattern or as having separate
requirements.

If no note is added adjacent to the feature control frames, the patterns are to be treated as a single
pattern.

Where it is desired to permit the patterns to be treated as separate patterns, a notation such as SEP
REQT is placed adjacent to each feature control frame.

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