Molecular Beam
Epitaxy
(MBE)
CONTENTS
Introduction
Working Principle of MBE
MBE process & Epitaxial growth
Working conditions
Operation
Control Mechanisms
Benefits and Drawbacks of MBE
Applications
Conclusion
Molecular beam Epitaxy is a technique
for epitaxial growth
via
the
Interaction of one or more molecular or
atomic beams that occur on a surface of
a heated crystalline substrate.
Epitaxy
Vapor-Phase Epitaxy (VPE)
Techniques
Liquid-Phase Epitaxy (LPE)
Modified method of chemical vapor deposition (CVD).
Undesired polycrystalline layers
Growth rate: ~2 m/min.
Hard to make thin films
Growth rate: 0.1-1 m/min.
Molecular Beam Epitaxy (MBE)
MBE is an ultra high vacuum(UHV) based technique for producing high
quality epitaxial structures with mono layer (ML) control.
Beam molecules do not collide to either chamber walls or existent gas
atoms.
We do MBE In a vacuum chamber (pressure: ~10-11 Torr).
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Why we go for
MBE ?
This technique for producing epitaxial layers
of metals, insulators , and super conductors
as well as both at the reserch and industrial
production level.
MBE: Working Principle
1.MBE:process: the term beam means the
evaporated atoms do not interact with each other or with
other vacuum chamber gases until they reach the wafer.
Ultra pure elements are heated in separate quasieffusion cells
(e.g ga and as) until they begin to
slowly sublimate.
2.Epitaxial growth: Epitaxial growth takes
place Due to the interaction of molecular or
atomic beams on a surface of a heated
crystalline substrate.
Molecular Beam Epitaxy**
They provide an angular distribution of atoms or molecules in
a beam.
The substrate is heated to the necessary temperature.
Atoms on a clean surface are free to move until finding
correct position in the crystal lattice to bond.
A commercial MBE system7
December 17, 2008
MASE 570 Micro and
Nanofabrication,
Fall 2008
MBE: Working Conditions
The mean free path ()
of the particles >
geometrical size of the
chamber.
Mean free path for Nitrogen molecules at 300 K *
That is easily fulfilled if the total pressure does not exceed 10 -5
torr.
It is also the condition for growing a sufficiently clean epilayer.
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December 17, 2008
MASE 570 Micro and
Nanofabrication,
Fall 2008
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Some attributes of MBE Chambers
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MBE: Operation
The vacuum system consist in a
stainless-steel growth chamber.
The pumping system usually
consists of ion pumps, cryogenic
pumps for the pumping of specific
gas species.
Ultra high vacuum is used to
obtain sufficiently clear epilayer
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Effusion cell :
Oven
Sample
Orifice
Test Chamber
Effusion cell beam system Pump
Effusion cells are the key components of an MBE system,
because they must provide excellent flux stability and unifomity
and material purity.
A collection of gas molecules moving in the same direction.
Oven contains the material to make beam.
Oven is connected to a vacuum system through a hole.
The substrate is located with a line of sight to the oven aperture
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MBE: Control Mechanisms
MBE systems permit the Control of composition and doping of the growing
structure at monolayer by changing the nature of the incoming beam just by
opening and closing mechanical shutters.
The operation time of a shutter is approximately 0.1s ,that is much
shorter than the time needed to grow one mono layer(typically 1-5s).
Molybdenum and tantalum are widely used for shutters.
what is RHEED
RHEED (Reflection High Energy Electron Diffraction) for monitoring
the growth of the crystal layers.
RHEED oscillations *
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Benefits and Drawbacks of
MBE
Benefits
Draw backs
Clean surfaces, free of an oxide layer.
good control of layer thick ness and
composition.
Low growth rate (1m/h),
So, we get high material purity.
Expensive (106 $ per MBE chamber)
Very complicated system
Epitaxial growth under ultra-high
vacuum conditions
Precisely controllable thermal
evaporation.
Seperate evaporation of each component
takes place.
Substrate temperature is not high.
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Applications
Hetero junction bipolar transistors(HBTs) used in satellite
communications.
Electronic and optoelectronic devices (LEDs for laser printers,
CD and DVD players).
Used in the construction of quantum wells , dots and wires for
use in lasers.
To build a solar cell by depositing a Thin film of a photo voltaic
material
Low temperature Super conductor.
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Conclusions
Objective: to deposit single crystal thin films
Typically in ultra-high vacuum
Deposition rates are very low (1m/hr)
Very well controlled (Shuttering: 0.1s)
Film growth with good crystal structure
Deposition rate is so low that substrate temperature
doesnt need to be as high.
Expensive
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VIDEOS OF MBE
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