Chapter 2 Spring 2024
Chapter 2 Spring 2024
1. Classical theory: The Drude model [drift velocity, ohms law, unipolar
conductivity]
2. Temperature dependence of resistivity: Ideal pure metals, Matthiessen’s
rule and the temperature coefficient of resistivity (α)
3. Thermal Conductivity: Wiedemann–Franz–Lorenz law, Thermal
resistance Example 2.21
4. The Hall effect and Hall Devices
• Electrical conduction: Electrical conduction involves the motion of charges in a material under the
influence of an applied electric field.
• Conduction electrons: In metals, due to the nature of metallic bonding, the valence electrons from the
atoms form a sea of electrons that are free to move within the metal and are therefore called conduction
electrons . It can be accelerated by an applied electric field.
Ohms Law
• When the conduction electrons are only scattered by =u a
thermal vibrations of the metal ions, then τ in the mobility
e
expression d = refers to the mean time between
me u
scattering events by this process. The resulting conductivity
and resistivity are denoted by σT and ρT, where the subscript
T represents “thermal vibration scattering.”
• To find the temperature dependence of σ, we first consider
the temperature dependence of the mean free time τ, since Electron
this determines the drift mobility. An electron moving with
1
a mean speed u is scattered when its path crosses the cross
=
sectional area S of a scattering centre, as depicted in Figure. SuN s
Since τ is the mean time taken for one scattering process, the
mean free path ℓ of the electron between scattering processes is
uτ.
If Ns is the concentration of scattering centers, then in the volume
Sℓ, there is one scattering center, that is, ( Su ) N = 1
s
Thus, the mean free time is given by
=u a
u
T = AT
lattice-scattering-limited
conductivity
Electron
Since in unit time, is the net probability of scattering The effective (or overall) resistivity ρ of the material is
simply
1 1 1
is the probability of scattering from lattice vibrations alone = = +
end enL enI
is the probability of scattering from impurities alone
= T + I
1
T =
1 I =
enL
Matthiessen’s rule gives the overall enI
resistivity of a metal as the sum of
individual resistivities due to scattering there is an additional resistivity,
from thermal vibrations, impurities, 1
the resistivity due to and crystal defects. If the resistivity due I =
scattering by thermal to scattering from thermal vibrations is enI
vibrations of the host denoted ρT and the resistivities due to
atoms. scattering from crystal defects and which arises from the scattering of the
For those near-perfect pure impurities can be lumped into a single electrons from the impurities And this
metal crystals, this is the resistivity term called the residual is not temperaute dependent
dominating contribution resistivity ρR, then = +
Temperature dependent T I
as 1
T
T
1 P
0 =
residual 0 T T =T0
resistivity the fractional change in the resistivity
per unit temperature increase at the
reference temperature T0
AT + B where ρ0 is the resistivity at the
where A and B are temperature-independent constants reference temperature T0
Nickel, Ni 59.0 1/125 1.72 Magnetic metal; 273 < T < 627K
3
0.1
.5
T5
0.01 2
.5 T5
0.001
1
.5 = R
= R
0.0001
0.00001
0
1 10 100 1000 10000 0 20 40 60 80 10
Temperature (K) T (K)
x
Fig. 2.19: Heat flow in a metal rod heated at one end. Consider the
rate of heat flow, dQ/dt, across a thin section x of the rod. The rate
of heat flow is proportional to the temperature gradient T/ x and the
cross sectional area A.
From Principles of Electronic Materials and Devices, Second Edition, S.O. Kasap (© McGraw-Hill, 2002)
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10000 Copper
1000 Aluminum
Al-14%Mg
10
1 10 100 1000
Temperature (K)
Fig. 2.21: Thermal conductivity vs. temperature for two pure metals
(Cu and Al) and two alloys (brass and Al-14%Mg). Data extracted from Equilibrium
Thermophysical Properties of Matter, Vol. 1: Thermal Conductivity,
Metallic Elements and Alloys, Y.S. Touloukian et. al (Plenum, New
York, 1970).
From Principles of Electronic Materials and Devices, Second Edition, S.O. Kasap (© McGraw-Hill, 2002)
Hot Cold
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(a) (b)
10-18 10-15 10-12 10-9 10-6 10-3100 103 106 109 1012
Conductivity (m)-1
+ + + + A
Bz
V
Fig. 2.26: Hall effect for ambipolar conduction as in a
semiconductor where there are both electrons and holes. The
magnetic field Bz is out from the plane of the paper. Both electrons
and holes are deflected toward the bottom surface of the conductor
and consequently the Hall voltage depends on the relative mobilities
and concentrations of electrons and holes.(E is the electric field.)
From Principles of Electronic Materials and Devices, Second Edition, S.O. Kasap (© McGraw-Hill, 2002)
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B B
B
F = qvB F = qvB
(a) (b)
Jy = 0
▪ Hall effect is a consequence of a charged Bz
y
carrier moving in the presence of VH V
+ + + + +
perpendicular electric and magnetic eEH x
z
fields. Jx Ex Jx
vdx
▪ When a conductor is placed in a
evdxBz
EH
IL
Wattmeter
IL
Since the Hall voltage depends on the product of two
quantities, the current density Jx and the transverse
Load applied magnetic field Bz, we see that the effect naturally
Source VL RL multiplies two independently variable quantities.
Therefore, it provides a means of carrying out a
multiplication process. One obvious application is
VL measuring the power dissipated in a load, where the load
IL
current and voltage are multiplied. There are many
IL
C C instances when it is necessary to measure magnetic fields,
V VH and the Hall effect is ideally suited to such applications.
Bz
Commercial Hall-effect magnetometers can measure
w magnetic fields as low as 10 nT, which should be compared
R
to the earth’s magnetic field of ∼50 μT. Depending on the
Ix = VL/R
VL application, manufacturers use different semiconductors to
obtain the desired sensitivity. Hall-effect semiconductor
Fig. 2.17: Wattmeter based on the Hall effect. Load voltage and load devices are generally inexpensive, small, and reliable.
current have L as subscript. C denotes the current coils. for setting Typical commercial, linear Hall-effect sensor devices are
up a magnetic field through the Hall effect sample (semiconductor)
From Principles of Electronic Materials and Devices, Second Edition, S.O. Kasap (© McGraw-Hill, 2002) capable of providing a Hall voltage of ∼10 mV per mT of
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applied magnetic field.