MBESTCommon Elements

1998

Portions of this document may be illegible electronic image products. Images are produced from the best available original document. DISCLAIMER This document w a s prepared as an account of work sponsored by an agency of the United States Government, Neither the United States Government nor any agency thereof, or any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its enforcement, recommendation, or favoring by the United States Government or any agency thereof. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or any agency thereof.

2017

EP O 727 715 8/1996 (*) Notice: Subject to any disclaimer, the term of this EP 1 O79 428 2/2001 patent is extended or adjusted under 35 EP 1 083 424 3/2001 U.S.C. 154(b) by 0 days. JP 61 290312 12/1986 WO WO 01/09934 A1 2/2001 WO WO 01/84382 A1 11/2001 (21) Appl. No.: 10/665,934 WO WO O2/O9170 A2 1/2002 (22) Filed: Sep. 19, 2003 WO WO O2/3718.6 A1 5/2002 WO WO 03/OO3447 A2 1/2003 (65) Prior Publication Data OTHER PUBLICATIONS US 2005/0064719 A1 Mar. 24, 2005 7 Yang, et al., “Line-Profile and Critical Dimension Measure (51) Int. Cl." .............................................. H01L 21/302 ments. Using a Normal Incidence Optical Metrology Sys (52) U.S. Cl. ....................................................... 438/725 tem.” Proceedings of SPIE vol. 4689, Mar. 2002. (58) Field of Search ................................. 438/689, 708, 438/710, 712, 714, 717, 751, 694, 706, (Continued) 707, 711, 725; 716/19, 21; 430/269,299 Primary Examiner-George Fourson ASSistant Examiner Broo...

2017

MULT-CHANNEL CONVOLUTION REVERB R.E.E. Report and Written Opinion, mailing date (75) Inventor: Steffan Diedrichsen, Hasloh (DE) Jul. 10, 2008 (15 pgs.). Jonathan Sheaffer et al. implementation of (73) Assignee: Apple Inc., Cupertino, CA (US) Impulse Response Measurement Techniques—An Intuitive Guide for Capturing your Own IRs'. Waves Audio Ltd., Tel-Aviv, Israel. (*) Notice: Subject to any disclaimer, the term of this XP-002485970, Apr. 2005, (3 two-sided pages). The IR-1, IR-L and IR-360 Parametric Convolution Reverbs, User's patent is extended or adjusted under 35 h d luti b U.S.C. 154(b) by 1429 days Guide, 2005, XP-002485972, 2005, whole document pp. 1-40, (10 M YWtwo-sided pages). Ronen Ben-Hador, et al., "Capturing Manipulation and Reproduction (21) Appl. No.: 11/713,167 of Sampled Acoustic Impulse Responses'. Audio Engineering Soci ety Convention Paper. Oct. 2004, San Francisco, CA, USA, (22) Filed: Mar. 1, 2007 XP-002485971, pp. 1-10, (5 two-sided pages).

Journal of the Patent Office Society. Patent Office Society (U.S.), 1989

fabric | ch - Selected Works, Texts and Exhibitions from the Archive 2007 - 1997, 2003

- Digital extension to MAMCO (Museum of Modern & Contemporary Art, Geneva) - Physical & digital museum - Information flow into architecture and artificial lights - Combined space -------------------------------------------------------------------------------------- - Installation by artist Heimo Zobernig

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3/1957 Schwab et al................... 23/253 TP 5/1962 Natelson........................... 23/230 R 2/1968 Natelson........................... 231253 R 9/1970 Findl et al....................... 23/253 TP lf 1971 Fetter.............................. 23/253 TP 8/1971 Dahlqvist......................... 1951 103.5 6/1972 Verbeck.......................... 23,1253 TP 4/1974 Lange et al..................... 23/253 TP 2,785,057 3,036,893 3,368,872 3,526,480 3,552,928 3,598,704 3,672,845 3,802,842

HAL (Le Centre pour la Communication Scientifique Directe), 2017

General informations Materials and Devices is a new journal devoted to all aspects of materials and related devices. It is Open Access and free of charges for authors. Our aim was to create a high quality journal, with a strict peer-review process, and complying with the transparency rules edicted by the DOAJ, COPE,... OAJ Materials and Devices-II Policy of the journal Materials and Devices is an Open Access (*) journal which publishes original, and peer-reviewed papers accessible only via internet, freely for all. Your published article can be freely downloaded, and self archiving of your paper is allowed! We apply « the principles of transparency and best practice in scholarly publishing » as defined by the Committee on Publication Ethics (COPE), the Directory of Open Access Journals (DOAJ), and the Open Access Scholarly Publishers Organization (OASPA). The journal has thus been worked out in such a way as complying with the requirements issued by OASPA and DOAJ in order to apply to these organizations. Evaluationpeer-reviewing : After reception, the paper is sent to two reviewers for evaluation. In case of divergent opinions of reviewers, the editor-in-chief sends the paper to a third reviewer and then gives a final decision based on all reports. Reviewers are asked to reply within three weeks to warranty a fast publication process.