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Modelling of Microwave Induced Plasmas

Abstract
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This research presents a comprehensive modeling approach for understanding Microwave Induced Plasmas (MIPs) through the development of multiple interconnected models: the Electromagnetic Model, Chemistry Model, and Deposition Model. The Grand Model integrates these aspects into a self-consistent framework employing balance equations to compute plasma behavior. Detailed validation against experimental results showcases the efficacy of these models, demonstrating their role in optimizing plasma processes relevant to applications such as optical fiber production.