Andre Anders

Leipzig University (Universität Leipzig), Leibniz Institute of Surface Engineering (IOM), Faculty Member

Universität Leipzig, Felix Bloch Institute of Solid State Physics, Faculty Member

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Andre Anders is Director of the Leibniz Institute of Surface Engineering (IOM) in Leipzig, Germany, and Professor of Applied Physics at the University of Leipzig. He assumed these positions after working over 25 years at Lawrence Berkeley National Laboratory, Berkeley, California.
His research interests are in the field of plasmas and materials, especially in arc and magnetron plasmas, plasma diagnostics, HiPIMS, thin films, diamond-like carbon, transparent conducting oxides, electrochromic materials, nanoparticles and nanocomposites.
Since 2014, Andre also serves as the Editor-in-Chief of Journal of Applied Physics.
Phone: +49(0)341 235-2308
Address: Permoserstr. 15
D-04318 Leipzig
Germany

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Bulk and thin film model samples for the analysis of the strain sensitivity of niobium-tin

Ion beam sputtering of silicon: Energy distributions of sputtered and scattered ions

Journal of vacuum science & technology, Aug 23, 2019

The properties of sputtered and scattered ions are studied for ion beam sputtering of Si by bomba... more The properties of sputtered and scattered ions are studied for ion beam sputtering of Si by bombardment with noble gas ions. The energy distributions in dependence on ion beam parameters (ion energy: 0.5-1 keV; ion species: Ne, Ar, Xe) and geometrical parameters (ion incidence angle, polar emission angle, scattering angle) are measured by means of energy-selective mass spectrometry. The presence of anisotropic effects due to direct sputtering and scattering is discussed and correlated with process parameters. The experimental results are compared to calculations based on a simple elastic binary collision model and to simulations using the Monte-Carlo code SDTrimSP. The influence of the contribution of implanted primary ions on energy distributions of sputtered and scattered particles is studied in simulations. It is found that a 10% variation of the target composition leads to detectable but small differences in the energy distributions of scattered ions. Comparison with previously reported data for other ion/target configurations confirms the presence of similar trends and anisotropic effects: the number of high-energy sputtered ions increases with increasing energy of incident ions and decreasing scattering angle. The effect of the ion/target mass ratio is additionally investigated. Small differences are observed with the change of the primary ion species: the closer the mass ratio to unity, the higher the average energy of sputtered ions. The presence of peaks, assigned to different mechanisms of direct scattering, strongly depends on the ion/target mass ratio.

Andre Anders

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