Papers by Theodor Nielsen
Waveguide and sensing technologies for AR/VR/MR
SPIE AR, VR, MR Industry Talks 2022, 2022
We present a process sequence for fabrication of smooth stamps for thermal nanoimprint lithograph... more We present a process sequence for fabrication of smooth stamps for thermal nanoimprint lithography (NIL) [1] having a protrusion tip less than 30 nm wide . The stamps are fabricated by standard micrometer resolution cleanroom processes, viz. UV-lithography, reactive ion etching (RIE), and oxidation. As a demonstrator hydrophilic, sealed nm-sized channels for DNA analysis are fabricated. The stamps are imprinted into 50k polymethylmethacrylate (PMMA) on a silicon substrate and the imprinted polymer pattern is used as a direct etch mask to fabricate nm-sized grooves in the silicon. The silicon grooves are oxidized to make the sidewalls hydrophilic. This oxidation step also offers an enhanced size control of the grooves. Finally, the grooves are sealed with a pyrex wafer by anodic bonding, resulting in nm-sized channels which can be used for DNA analysis [2,3].
Nanochannels for DNA stretching fabricated by standard cleanroom processing and nanoimprint lithography
Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004., 2004
... Brian Bilenberg, Carine Pastore, Theodor Nielsen, Simon Riis Enghoff, Claus Jeppesen, Asger V... more ... Brian Bilenberg, Carine Pastore, Theodor Nielsen, Simon Riis Enghoff, Claus Jeppesen, Asger Vig Larsen, and Anders Kristensen MIC - Department of Micro and Nanotechnology, Technical University of Denmark (DTU), Oersteds Plads, Building 345 ... [4] A. A. Ay6n et al., Mat. ...
18th IEEE International Conference on Micro Electro Mechanical Systems, 2005. MEMS 2005., 2005
The design, fabrication and pedomance of a flexible silicon stamp for homogenous large area nanoi... more The design, fabrication and pedomance of a flexible silicon stamp for homogenous large area nanoimprint lithography (NIL) are presented. The flexible stamp is fabricated by bulk semiconductor micro machining of a 4-inch silicon wafer and consists of thick anchor-like imprint areas connected by membranes. The bending stiffness difference between the imprint areas and the membranes ensures that the deformation of the stamp during the imprint process mainly takes place in the membranes, leaving the imprint structures unaffected. By this design the strong demand to the parallelism between stamp and substrate in the imprint situation is decoupled from the pressing tool and the wafer quality. The stamp consist of 1562 imprint areas (1 mm x 1 mm) containing the pattems to be replicated. The imprinted patterns are characterized with respect to the imprint depth and the polymer residual layer thickness. It is found that within a 50 111111 diameter the polymer residual layer thickness is 18.8 nm with a standard deviation of 6.6 nm.
CYCLIC OLEFIN COPOLYMER (COC/TOPAS®) - AN EXCEPTIONAL MATERIAL FOR EXCEPTIONAL LAB-ON-A-CHIP SYSTEMS
The cyclic olefin copolymer Topas® (1) has a number of advantages over polymers like PMMA and PC ... more The cyclic olefin copolymer Topas® (1) has a number of advantages over polymers like PMMA and PC traditionally used in fluid micro system manufacturing, such as low water absorption, high chemical resistance and good machinability. We present a number of different processes for making all-Topas microfluidic system, like micro milling, micrometer scale soft embossing and bonding. Furthermore, we present a
Optical characterisation of photonic wire and photonic crystal waveguides fabricated using nanoimprint lithography
2006 European Conference on Optical Communications, 2006
We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimp... more We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimprint lithography. The structures, with feature sizes down below 20 nm, are benchmarked against similar structures defined by direct electron beam lithography.
DWDM laser arrays fabricated using thermal nanoimprint lithography on Indium Phosphide substrates
Nanoimprint lithography of PMMA based lasers
Dissolution Investigations of TOPAS for Homogeneous Imprints
A Nano-Imprinted Plastic Laser
Nanoimprint lithography of PMMA lasers
Nanoimprint lithography of polymer micro cavity dye lasers
Microprocesses & Nanotechnology-Nanoimprint, Nanoprint and Rising Lithography-Technology for Fabrication of Nanostructures by Standard Cleanroom Processing and Nanoimprint Lithography
Injection molding tools with micro/nano-meter pattern
Method for performing electron beam lithography
Flexible nano-imprint stamp
Nanoimprint lithography in the cyclic olefin coloymer, Topas, a highly ultraviolet-transparent and chemically resistant thermoplast
Optics express, Jan 5, 2007
We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabrica... more We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabricated by nanoimprint lithography. In our demonstration, we have realized ordinary and topology-optimized photonic crystal waveguide structures. The topology-optimized structures require lateral pattern definition on a sub 30-nm scale in combination with a deep vertical silicon etch of the order of ~300 nm. The nanoimprint method offers a cost-efficient parallel fabrication process with state-of-the-art replication fidelity, comparable to direct electron beam writing.
Microelectronic Engineering, 2015
In this work we demonstrate that Reverse Nanoimprint Lithography is a feasible and flexible litho... more In this work we demonstrate that Reverse Nanoimprint Lithography is a feasible and flexible lithography technique applicable to the transfer of micro and nano polymer structures with no residual layer over areas of cm 2 areas on silicon, metal and non-planar substrates. We used a flexible polydimethylsiloxane stamp with hydrophobic features. We present residual layer-free patterns imprinted using a commercial poly(methylmethacrylate) thermoplastic polymer over silicon, nickel and pre-patterned substrates. Our versatile patterning technology is adaptable to free form nano structuring and has coupling to adhesion technologies.
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Papers by Theodor Nielsen