Effect of N2 plasma on yttrium oxide and yttrium–oxynitride dielectrics
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2004
In this article, we report the effect of nitrogen plasma, during and after deposition, on nitroge... more In this article, we report the effect of nitrogen plasma, during and after deposition, on nitrogen incorporation into yttrium oxide dielectric films. Films are deposited using a yttrium β-diketonate precursor (Y(tmhd)3) introduced downstream from a O2 or N2 plasma. The precursor acted as a significant source of oxygen, and only small amounts of N (<10 at. %) were incorporated in the films. Chemical bonding, concentration, and distribution of N in Y-oxide films after deposition and after high-temperature anneal were characterized using x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and Auger electron spectroscopy. C–N is the primary form of nitrogen bonding in the as-deposited films, and IR results indicate the exchange of N with O to form C–O bonds occurs during prolonged exposure to air. High-temperature annealing releases N from the surface of as-deposited films, and results in a film structure that is resistant to further N incorporation. Results su...
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Papers by Dow-Chih Niu