Plasmonics: Metallic Nanostructures and Their Optical Properties XII, 2014
Plasmonic structures can be used to enhance electromagnetic radiation, and nanoscale (<5 nm) gaps... more Plasmonic structures can be used to enhance electromagnetic radiation, and nanoscale (<5 nm) gaps can increase this enhancement even further. Fabrication of these desired structures involves using a relatively new, previously developed self-aligned process to overcome typical electron beam lithography resolution limits. The resulting nanogap structures have been shown to exhibit enhanced optical emission. This technique enables the fabrication of a large-area twodimensional matrix of such nanostructures which could prove useful for photovoltaics, plasmonically enhanced Raman spectroscopy, biosensing, and other optoelectronic applications. Computational electromagnetic simulations of the structures will prove useful for predicting behavior upon interaction with light and for experimental comparison.
Fabrication of sub-10 nm features is advantageous for continued improvement of plasmonic enhancem... more Fabrication of sub-10 nm features is advantageous for continued improvement of plasmonic enhancement applications. This letter demonstrates a technique, called nanomasking, which can fabricate nanostructures and gaps below the resolution limit of the lithography technique used in the process: nanogaps that are less than 10 nm in width, and nanostructures with 15 nm widths. This method improves upon existing techniques for creating metallic features at this scale, and it is also scalable for mass production. Unique structures that can be fabricated with this technique have been optically investigated to provide evidence as to their potential plasmonic applications.
Plasmonics: Metallic Nanostructures and Their Optical Properties XII, 2014
Plasmonic structures can be used to enhance electromagnetic radiation, and nanoscale (<5 nm) gaps... more Plasmonic structures can be used to enhance electromagnetic radiation, and nanoscale (<5 nm) gaps can increase this enhancement even further. Fabrication of these desired structures involves using a relatively new, previously developed self-aligned process to overcome typical electron beam lithography resolution limits. The resulting nanogap structures have been shown to exhibit enhanced optical emission. This technique enables the fabrication of a large-area twodimensional matrix of such nanostructures which could prove useful for photovoltaics, plasmonically enhanced Raman spectroscopy, biosensing, and other optoelectronic applications. Computational electromagnetic simulations of the structures will prove useful for predicting behavior upon interaction with light and for experimental comparison.
Fabrication of sub-10 nm features is advantageous for continued improvement of plasmonic enhancem... more Fabrication of sub-10 nm features is advantageous for continued improvement of plasmonic enhancement applications. This letter demonstrates a technique, called nanomasking, which can fabricate nanostructures and gaps below the resolution limit of the lithography technique used in the process: nanogaps that are less than 10 nm in width, and nanostructures with 15 nm widths. This method improves upon existing techniques for creating metallic features at this scale, and it is also scalable for mass production. Unique structures that can be fabricated with this technique have been optically investigated to provide evidence as to their potential plasmonic applications.
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