three dimensional SEMとは 意味・読み方・使い方

To provide an electron beam device that can prevent damages to the device and can make compatible low aberration, high resolution or high S/N ratio, with easiness of defect classification by obtaining a three-dimensional SEM image.例文帳に追加

デバイス損傷を防止することが可能であり、低収差、高分解能若しくは高Ｓ／Ｎ比と、立体的なＳＥＭ像を得ることによる欠陥分類の容易さと、を両立させる。 - 特許庁

To provide a three-dimensional shape measuring device which obtains cross section shape pattern information useful for determining etching process conditions using in-line SEM images obtained by non-destructive manner, and to realize effective process control by obtaining section shape pattern information using a SEM which is non-destructive and relatively easy to measure.例文帳に追加

エッチングプロセス条件決定に有効なパターン断面形状情報の取得を非破壊で観察可能なインラインＳＥＭの画像を用いて行い、また非破壊で比較的容易に測定が可能なＳＥＭによって断面形状情報を取得することで、効率のよいプロセス制御を実現する。 - 特許庁

An area size where existence of surrounding patterns is to be considered, based on an internal diffusion length of incident electron beam is decided, three-dimensional information of patterns in the area size is formed using design layout data, and a library correlating a cross-sectional shape of a SEM signal waveform and a cross-sectional shape is formed using the three-dimensional information.例文帳に追加

入射電子線の内部拡散長に基づいて周囲パターンの有無を考慮すべき領域のサイズを決定し，設計レイアウトデータを用いて，前記領域サイズ内のパターンの三次元情報を作成，この三次元情報を用いて，ＳＥＭ信号波形と断面形状とを関連づけるライブラリを作成する。 - 特許庁

To provide a method of removing blur of a pattern image acquired by an SEM and easily and accurately measuring the three-dimensional shape of a pattern of a sample surface based on information of the height direction of a pattern acquired by another measuring machine such as an AFM.例文帳に追加

ＳＥＭによって得られたパターン画像のボケを除去し、ＡＦＭなどの他の計測機で得られたパターンの高さ方向の情報と合わせ、試料表面のパターンの３次元形状を簡便にかつ精度良く計測する方法を提供する。 - 特許庁

In reviewing the defects, by irradiating the primary electron beam on the testpiece in such a state that the deflection amount of the electrostatic deflector 12 is reduced than the detection time of defects, and by forming the secondary electron microscopic picture of the defect candidate of the testpiece 19, the three-dimensional SEM image is obtained.例文帳に追加

欠陥レビュー時には、静電偏向器１２の偏向量を欠陥検出時より低下させた状態で１次電子線を試料に照射して試料１９の欠陥欠陥候補の２次電子画像を形成することにより立体的なＳＥＭ像が得られる。 - 特許庁