misimplantとは 意味・読み方・使い方

発音

• (verb) IPA^(key): /ˌmɪsɪmˈplænt/, /ˌmɪsɪmˈplɑːnt/
• (noun) IPA^(key): /mɪsˈɪmplænt/, /mɪsˈɪmplɑːnt/

動詞

misimplant (三人称単数 現在形 misimplants, 現在分詞 misimplanting, 過去形および過去分詞形 misimplanted)

1. To implant incorrectly.
   • 1967, Melvin Herman Marx, ‎Tom M. Tombaugh, ‎Tom N. Tombaugh, Motivation: Psychological Principles and Educational Implications, page 137:

     Moreover, it was an accidental finding resulting from a misimplanted electrode in an experiment originally designed to study the RAS.

   • 2009, Eugenia Tsao, “Nature/Culture Dichotomies in Bioethics Debates”, in Science As Culture, volume 18, number 4:

     Internet chatter ebbed and flowed with a predictable, prescriptive voyeurism: some readers anguished over the woman's choice to terminate the pregnancy, while others puzzled over the lack of indignation (かつ indeed the sympathy) evinced by the couple whose egg had been misimplanted;

   • 2012, Robert Zorich, Handbook of Quality Integrated Circuit Manufacturing, page 372:

     The wafers may become misimplanted when the implant species comes in […]

   • 2019, Dov Fox, Birth Rights and Wrongs, page 68:

     And the lasting consequences of an embryo mix-up reach further than any "psychological trauma” associated with “the possibility that the child that [an IVF couple] wanted so desperately” could, because their embryos were misimplanted into another patient, “be born to someone else and that they might never know his or her fate."

名詞

misimplant (複数形 misimplants)

1. An instance of misimplanting; misimplantation.
   • 1987, WL Smith, A Rosencwaig, DL Willenborg, J Opsal, MW Taylor, “Ion implant monitoring with thermal wave technology”, in Nuclear Instruments and Methods in Physics; Research Section B: Beam Interactions with Materials and Atoms, volume 21:

     Using the procedure of inspection of one wafer from each cassette plus all wafers suspected by the operator of possible misimplant, an essentially total elimination of implant-related zero-yield wafers was achieved on a CMOS fab line providing high-performance VLSI devices

   • 1988, LA Larson, “An Industry‐Wide Evaluation of Ion Implant Dosing Accuracy”, in Journal of the Electrochemical Society, volume 135, number 7:

     This group had 3 of the 42 wafers excluded from the data base due to misimplants and/or difficulties in probing the resulting layers.