lmp-1とは 意味・読み方・使い方

Equation 1 is LMP=(T+273)*(20+Log t) wherein, 20 is the material constant of copper, T is temperature (°C), and t is time (hr).例文帳に追加

式１：ＬＭＰ＝（Ｔ＋２７３）＊（２０＋Ｌｏｇｔ） ここで、２０は銅の材料定数、Ｔは温度（℃）、ｔは時間（hr）である。 - 特許庁

Formula 1 is LMP=(T+273)*(20+Logt) [wherein, 20 represents a material constant of copper; T represents a temperature (°C), and t represents a time (Hr)].例文帳に追加

式１：ＬＭＰ＝（Ｔ＋２７３）＊（２０＋Ｌｏｇｔ）ここで、２０は銅の材料定数、Ｔは温度（℃）、ｔは時間（Ｈｒ）。 - 特許庁

This lamp control system is provided with a target irradiating direction setting means (ECU) 1 for setting a target irradiating direction of the lamp LMP according to a traveling state of a vehicle and the actuator (SACT) 2 for driving and controlling the irradiating direction of the lamp LMP based on the target irradiating direction by making the initially set irradiating direction as a reference.例文帳に追加

車両の走行状況に応じてランプの照射目標方向を設定する照射目標方向設定手段（ＥＣＵ）１と、初期設定された照射方向を基準にして照射目標方向に基づいてランプＬＭＰの照射方向を駆動制御するアクチュエータ（ＳＡＣＴ）２とを備える。 - 特許庁

The liquid crystal display device is provided with lateral electric field controlling electrodes LMP for mitigating or shielding lateral electric fields LE formed between pixel electrodes PT-1...PT-3 in a direction nearly parallel to a first and a second substrates SUB1 and SUB2 between adjacent electrodes of the pixel electrodes PT-1...PT-3.例文帳に追加

画素電極ＰＴ−１・・ＰＴ−３の隣接する電極間に当該画素電極間に形成される第１および第２の基板ＳＵＢ１，ＳＵＢ２と略平行な方向に形成される横電界ＬＥを緩和もしくは遮蔽するための横電界抑制電極ＬＭＰを具備した。 - 特許庁

The electrolytic copper foil is produced such that after thermal treatment is applied to the electrolytic copper foil so that the LMP value shown in formula 1 is 9,000 or more, the crystal structure shows a red or blue color tone of 80% or more with respect to a plane with EBSP analysis.例文帳に追加

電解銅箔に式１に示すＬＭＰ値が９０００以上となる加熱処理を施した後の結晶構造がＥＢＳＰの分析で面に対する赤系・青系のいずれかの色調が８０％以上を占める電解銅箔。 - 特許庁

In the electrolytic copper coating film manufactured by electrolytic deposition, the electrolytic copper coating film and a method for forming the same obtain crystal distribution having ≥70% of the heat treated crystal grains having a maximum crystal grain length of 10 μm or more when a heat treatment in which the LMP value shown in equation 1 is 9,000 or greater is applied.例文帳に追加

電解析出で製造した電解銅皮膜において、式１に示すＬＭＰ値が９０００以上となる加熱処理を施すと、加熱処理後の結晶粒の最大長さが１０μｍ以上となる結晶粒子が７０％以上存在する結晶分布となる電解銅皮膜とその製造方法。 - 特許庁